Title: On hydrogen penetration into ruthenium
Speaker: Chidozie Onwudinanti (Computational Materials Physics Group, DIFFER)
Time: April 16, 2020, 10:00–11:00
Location: Online seminar (Skype)
The multi-layer reflectors used in extreme ultraviolet lithography (EUV) machines have a top layer of ruthenium; the plasma source of the EUV photons is tin; and the buffer/cleaning gas for the reflector in the near-vacuum of the machine is hydrogen. The interaction of these three elements is of critical importance to the operation of the machines, as hydrogen penetration into the ruthenium can result in damage. This presentation gives an overview of the computational study of the diffusion of hydrogen on, in, and into ruthenium, and the effect of tin on this diffusion.